HALO® 1.5 mm ID Columns by Advanced Materials Technology

Manufacturer Advanced Materials Technology  |  Available Worldwide

Meet the new HALO ® 1.5 mm ID columns designed to deliver more performance, increased sensitivity and offer 50% solvent savings over 2.1 mm ID columns which helps to meet laboratory sustainability initiatives. 
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HALO<sup>®</sup> 1.5 mm ID Columns by Advanced Materials Technology product image
HALO® 1.5 mm ID Columns

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The adoption of UHPLC instrumentation pushed LC separations to a new level of speed and resolution. In the years since chromatographers have continued to push separation limits in response to increasing challenges. How can I improve my separation in a faster time, or with less solvent consumption, increased sensitivity, or all of the above? While the specific drivers may be different, the overall goal is the same – ‘I need more, but without sacrificing anything’.

In 2006 Advanced Materials Technology broke from convention by introducing Fused-Core® particle technology to the market. These little HALO® particles delivered high-speed, high-performance separations without the consequence of high back pressures allowing scientists to adapt their HPLC systems to rival the UHPLC systems.

Now AMT breaks new ground again with a 1.5 mm internal diameter
HALO® column to push the boundaries of adopted UHPLC systems. Founded on all of the benefits of Fused-Core® particles, the HALO® 1.5 delivers increased sensitivity and reduced solvent consumption, allowing scientists to experience the benefits of capillary columns without the pains of specialized microflow systems.

Delivering more performance

  • More sensitivity from conventional UHPLC Systems
  • Higher ionization efficiencies from LCMS systems
  • Reduce solvent consumption compared to 2.1 mm ID columns
  • Easy to implement microflow solution

Product Overview

HALO<sup>®</sup> 1.5 mm ID Columns by Advanced Materials Technology product image

HALO® 1.5 mm ID Columns

Manufacturer Advanced Materials Technology  |  Available Worldwide

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