Park NX-Mask by Park Systems
Manufacturer Park Systems | Available Worldwide
Park NX-Mask is the most effective, safe and efficient Photomask Repair System for High-end EUV Mask Repairs.
Park NX-Mask
Park NX-Mask is an innovative new generation photomask repair equipment that incorporates advanced atomic force microscopy technology.
It provides an all-in-one solution - from automatic defect review to repair and verification - accelerating throughput with unprecedented repair efficacy.
Key Features
- No risk of damage and seamless repair of any type of defects
- Compatible with a dual pod for handling EUV masks
- All-in-one solution for locating defects and post-repair verification
Product Overview
