Park NX-Mask by Park Systems

Manufacturer Park Systems  |  Available Worldwide
Park NX-Mask is the most effective, safe and efficient Photomask Repair System for High-end EUV Mask Repairs.

Park NX-Mask by Park Systems product image
Park NX-Mask
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Park NX-Mask is an innovative new generation photomask repair equipment that incorporates advanced atomic force microscopy technology. 

It provides an all-in-one solution - from automatic defect review to repair and verification - accelerating throughput with unprecedented repair efficacy.

Key Features

  • No risk of damage and seamless repair of any type of defects
  • Compatible with a dual pod for handling EUV masks
  • All-in-one solution for locating defects and post-repair verification