Direct Write E-beam Lithography System
JBX-9500F
JEOL has more than 50 years of e-beam expertise. The JBX-9500FS is an electron beam lithography system featuring a spot beam, Vector scan, and a step and repeat stage. Capable of varying the beam size widely, the system is versatile in its applications from basic research of elements to test production of optical elements to research and development for masks for high accelerating voltage exposure. Its dynamic correction system eliminates defocusing resulting from beam deflection.
Key Features:
- ZrO/W (Schottky) Emitter
- Beam size: 4 to 200 nm (100 kV) and 7 to 200 nm (50 kV)
- Up to 300mm wafer
Product Overview
