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Thickness Analysis of a Natural Oxide Film on a Microscopic Si Pattern

Thickness Analysis of a Natural Oxide Film on a Microscopic Si Pattern

8 Jul 2015

In this application note, the thickness of the SiO2 layer on a sample was analyzed from an obtained reference spectra using the MSV-5000 from JASCO. The MSV-5000 series micro-spectrophotometer is ideal for transmission and reflection measurements of samples as small as 10 μm diameter over a wide wavelength range from the ultraviolet to the near-infrared wavelengths.

V-780 UV-Visible/NIR Spectrophotometer

JASCO (USA)

The V-780 UV-Visible-Near Infrared (UV-Vis/NIR) spectrophotometer features a monochromator with automatically exchanged dual gratings: 1200 lines/mm for the UV/VIS region; 600 lines/mm for the NIR region. A PMT detector is provided for the UV-visible region and a high sensitivity InGaAs photodiode detector is employed for the NIR region. Both gratings and detectors are automatically exchanged within the user selectable 800 to 900 nm range.

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Thickness Analysis of a Natural Oxide Film on a Microscopic Si Pattern