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JBX-3050

Name: JBX-3050
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JEOL USA

E-Beam Mask/Reticle Writer

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Description

JEOL has more than 50 years of e-beam expertise. The JBX-3050MV series is an electron beam lithography system for mask/reticle fabrication that meets the design rule of 45 to 32 nm. This system features pattern writing with high speed, high accuracy and high reliability, achieved by high-end technology.