NX2000
FIB-SEM for the semiconductor sector with 200mm wafer coverage
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NX2000 is a FIB-SEM optimised for semiconductor applications (defect analysis with KLARF coordinate import, TEM lamella extraction, device development). With 205 x 205 mm X,Y travel, the sample stage even allows full-surface processing of 200 mm wafers without sample rotation. The vertically mounted Ga FIB allows up to 100nA ion current at 30 kV. The FE-SEM column is equipped with a cold field emitter.
Brochures
Hitachi Product Catalogue 2024/25- German
In this brochure, Hitachi High-Technologies present a wide range of electron microscopes and ion beam systems available, organised by product class, in German. Each tool is designed to reliably meet your application needs.
Hitachi Product Catalogue 2024/25- English
In this brochure, Hitachi High-Technologies present a wide range of electron microscopes and ion beam systems available, organised by product class. Each tool is designed to reliably meet your application needs.
