Rigaku Presents High Performance Thin Film Coatings and Optics at 2018 SPIE Photomask Technology Conference

Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optics for coatings is pleased to announce its attendance at the SPIE Photomask Technology + Extreme Ultraviolet Lithography 2018 meeting in San Diego, California.

SPIE is the international society for optics and photonics. The event takes place, Tuesday, August 21 through Thursday, August 23, 2018 at the San Diego Convention Center.

As the components division of Rigaku Corporation, RIT is a global supplier of high-performance multilayer optics used in commercial and academic institutions and government research facilities. RIT develops thin-film coated products and coating processes for a wide variety of Xray applications including Extreme Ultra Violet (EUVL) for precision diffractive optics used in astronomical research and related studies. RIT also offers single film, multilayer and crystal optics for synchrotron beamlines and end-stations.

RIT is presenting its high-reflectivity and precision coatings and analysis optics booth 615.

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