PE-75 Plasma Asher by Plasma Etch

Manufacturer Plasma Etch  |  Available Worldwide
1.3
/
5.0
  |  1 reviews
A great value solution for plasma ashing semiconductor wafers


PE-75 Plasma Asher by Plasma Etch product image
PE-75 Plasma Asher

Plasma Etch

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Average Rating: 1.3
1 Scientist has reviewed this product

2 out of 5
Ease of use
1 out of 5
After sales service
1 out of 5
Value for money


  • Status:

    Reviewer
  • Member since: 2022

  • Organization: Smart Material Solutions, Inc.



  • Ease of use
    2 out of 5
    After sales service
    1 out of 5
    Value for money
    1 out of 5
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Nonuniform, flickering, and dim plasma. Poor customer service.
Rating: 1.3

  • Application Area: Plasma ashing

"Our PE-75 system did not create a plasma upon arrival. Tech support eventually helped us make a nonuniform, flickering, and dim plasma and told us this was normal. Here are a few specifics: 1. Poor Uniformity: Above ~200 mTorr, our plasma is only in one corner of the chamber. Although Plasma Etch claims “uniform plasma generation,” tech support told us, “sometimes there are hotspots; this is normal.” 2. Poor Stability: Despite claims that the system works with pressures of 100-400 mTorr, our plasma flickers above ~200 mTorr. 3. Low Etch Rate: Our plasma is very dim and etches an order of magnitude slower than other systems with oxygen and air. Plasma Etch first suggested that all low-frequency systems etch slowly, but our partner’s low-frequency PE-50 was far superior to our system. Plasma Etch then claimed that we couldn’t expect similar etch rates from these systems, contradicting their website which states, “The PE-75 has all the features of the PE-50 XL but also features a larger chamber size.” 4. False Performance Claims: Plasma Etch says we cannot expect our system to work for our samples. This contradicts many emails and a discussion in which this system was suggested to us. For example, our salesperson told us he would not recommend our system to ash wafers, yet their website claims the PE-75 is “the best value in the industry for plasma ashing semiconductor wafers.” 5. Poor Customer Service: The system has a one-year warranty, but we were asked to pay freight shipping (~$700 round trip) for the repair. We fear we will pay this in vain and they will return the system in the same poor condition since they keep saying it is working normally. In conclusion, either our system is malfunctioning or Plasma Etch’s brochures and website are full of false claims. Save yourself a headache and buy from a vendor such as the Diener, March, Glow Research, or MicroNanoTools. Diener has plenty of positive reviews, and their ATTO system costs thousands less than the PE-75."

Review date: 13 Apr 2022 | PE-75 Plasma Asher

Plasma ashing is the process of removing photoresist from an etched wafer. Ashing is performed with fluorine or oxygen and is almost always used with a single gas plasma. The versatile PE-75 comes with two gases installed for other cleaning and ashing purposes.

The PE-75 is a feature packed, low cost, and robust machine that is a great choice for production facilities, research labs, universities, medical facilities, or any industry which needs a small-scale, cost-effective plasma ashing solution. It has all the features of the PE-50 XL but also features a larger chamber size for larger processing applications.

This unit excels at plasma cleaning and surface modification as well as use as a plasma asher.

The PE-75 may also be used in preparing asbestos specimens as a low temperature plasma treatment.

Product Overview

PE-75 Plasma Asher by Plasma Etch product image

PE-75 Plasma Asher

Manufacturer Plasma Etch  |  Available Worldwide

1.3 / 5.0 | 1 reviews