PE-100 Benchtop Plasma System by Plasma Etch

Manufacturer Plasma Etch
3.7
/
5.0
  |  1 reviews
The PE-100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. This model is perfect for manufacturers, medical facilities, universities, research facilities, or any other company in need of a cost-effective, production-grade plasma processing solution.  The convenient chamber size, along with the availability of high frequency RF power, combine to create a production capable unit small enough to fit nearly anywhere in your lab or ... Read more


PE-100 Benchtop Plasma System by Plasma Etch product image
PE-100 Benchtop Plasma System

Plasma Etch

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Average Rating: 3.7
1 Scientist has reviewed this product

5 out of 5
Ease of use
4 out of 5
After sales service
2 out of 5
Value for money


  • Status:

    Reviewer
  • Member since: 2018

  • Organization: UCLA



  • Ease of use
    5 out of 5
    After sales service
    4 out of 5
    Value for money
    2 out of 5
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Great when working, often fails to generate plasma
Rating: 3.7

  • Application Area: Plasma cleaning

"Plasma system works well when plasma is struck but there is an unpredictability in performance regarding plasma generation run to run. For no obvious reason, the cleaner will at times fail to generate plasma."

Review date: 06 Feb 2018 | PE-100 Benchtop Plasma System

The PE-100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. This model is perfect for manufacturers, medical facilities, universities, research facilities, or any other company in need of a cost-effective, production-grade plasma processing solution. 

The convenient chamber size, along with the availability of high frequency RF power, combine to create a production capable unit small enough to fit nearly anywhere in your lab or production work space. 

Full laptop control enables enhanced consistency and complexity of recipes. PC automation also provides ease of use on the production floor.

This model is available in one of three standard configurations:

  1. Plasma Cleaning/Plasma Etching
  2. Reactive Ion Etching (RIE)
  3. Convertible Configuration - Includes both isotropic and anisotropic plasma processing in a single system. Removable tray configuration.