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Manufacturer JEOL USA
Direct Write E-beam Lithography System
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JBX-8100FS by JEOL USA product image

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JEOL has more than 50 years of e-beam expertise. Our latest generation of direct write tools, the JEOL JBX-8100FS series spot beam, vector scan, step-and-repeat lithography system is designed for higher throughput and lower operating costs. The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process, thus increasing throughput.

Key Features:

  • Small footprint
  • Low power consumption
  • High throughput
  • ZrO/W (Schottky) Emitter
  • Stage positions measured and controlled in 0.6nm steps (0.15nm steps optional)
  • Field size 100 μm × 100 μm (high resolution mode) and 1,000 μm × 1,000 μm (high throughput mode)
  • Overlay accuracy ±9 nm or less (high resolution mode) and ±20 nm or less (high throughput mode)
  • Sample size - wafers up to 200mm, masks up to 6-inch, micro samples of any size

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