Products & ReviewLife Sciences
JBX-8100FS
Direct Write E-beam Lithography System
![JEOL USA](https://cdn.sanity.io/images/f5b6mtfn/selectscience-prod/e77655c6f9b1d6a90043426f3a53cc8617e0cf69-300x175.jpg?w=256&q=75&fit=clip&auto=format)
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JEOL has more than 50 years of e-beam expertise. Our latest generation of direct write tools, the JEOL JBX-8100FS series spot beam, vector scan, step-and-repeat lithography system is designed for higher throughput and lower operating costs. The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process, thus increasing throughput.
Key Features:
- Small footprint
- Low power consumption
- High throughput
- ZrO/W (Schottky) Emitter
- Stage positions measured and controlled in 0.6nm steps (0.15nm steps optional)
- Field size 100 μm × 100 μm (high resolution mode) and 1,000 μm × 1,000 μm (high throughput mode)
- Overlay accuracy ±9 nm or less (high resolution mode) and ±20 nm or less (high throughput mode)
- Sample size - wafers up to 200mm, masks up to 6-inch, micro samples of any size