JBX-A9 Electron Beam Lithography System
JBX-A9 Electron Beam Lithography System

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JBX-A9 Series Features
- High Precision and High Throughput Direct Writing System
- Built with JEOL’s renowned Electron Optics for ultimate stability
- Loadable wafer up to 300 mm
- FOUP system optionally available
- In-line extendibility to other process tools such as coaters and developers
- Low power consumption
- Improved ease-of-use for all experience levels

















