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JBX-A9 Electron Beam Lithography System

JEOL USAJBX-A9

JBX-A9 Electron Beam Lithography System

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JBX-A9 Series Features

  • High Precision and High Throughput Direct Writing System
  • Built with JEOL’s renowned Electron Optics for ultimate stability
  • Loadable wafer up to 300 mm
  • FOUP system optionally available
  • In-line extendibility to other process tools such as coaters and developers
  • Low power consumption
  • Improved ease-of-use for all experience levels

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