Application Note: Choosing the Optimal High Purity Water Source for ICP-MS
12 July 2017
Ultrapure water is highly prone to contamination, as it can easily leach contaminants out of container surfaces and absorb contamination from the laboratory environment. As ultrapure water is used most frequently in ICP-MS as references and for instrument cleaning, its purity is essential. The following application note discusses the optimal sources of ultrapure water for ICP-MS.