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Ultimate solution for ultra-thin-film systems

16 Jul 2023

Reliable measurements of the elastic modulus of thin films are particularly challenging due to the so-called substrate effect. The prevalent rule of limiting indentation depth to 10% of the coating thickness to avoid the substrate influence in the mechanical properties is challenging to ensure, especially when the film thickness goes below 200 nm. In this application note, Bruker Nano quantitatively determines elastic properties of ultra-thin-film systems of 10 nm or below by combining the ultra-low-noise xProbe™ transducer and analytical Intrinsic Thin Film Solution.

Hysitron TI 980

Bruker Nano Surfaces and Metrology

The Hysitron TI 980 nanoindenter achieves remarkable advances in control and throughput capabilities, testing flexibility, applicability, measurement reliability, and system modularity. This industry-leading system builds upon decades of Hysitron technological innovation to deliver new levels of extraordinary performance, enhanced capabilities, and ultimate versatility in nanomechanical characterization. 

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