Application Note: Analysis of Metallic Tungsten by HR ICP-OES on PlasmaQuant® PQ 9000
28 July 2015

The rapid analysis of traces impurities in refractory metals and alloys is an important part of the quality-control process in the manufacture of these materials. All classical atomic spectrometry techniques, however, have major disadvantages with respect to trace detectability in these matrices, which for example arise from the high atomization temperatures (AAS), the wealth of emission lines (ICP-OES) and adverse metal oxide formation (ICPMS) of refractory elements like W, Mo, Ta and Nb. In this application note, a certified control solution supplied by a tungsten manufacturer was analyzed using the PlasmaQuant® PQ 9000.