Application Note: Measuring inorganic impurities in semiconductor manufacturing
28 July 2022
The new edition of the Agilent ICP-QQQ Semiconductor Applications Compendium contains 20+ optimized methods to measure impurities in:
- Wafer precursor and substrate materials
- Ultrapure water and hydrogen peroxide
- Acids and other process chemicals
- Solvents and other organic chemicals
- High purity metals
- Precursor and process gases
The methods include instrument configuration and tuning parameters, sample and standard preparation details and representative results.
The compendium will be a valuable resource for suppliers to fab plants aiming to control inorganic impurities to meet product specifications.
