New Gas Analysis Systems for Pressure Ranges Up To 50 mbar

31 Jul 2012
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Pfeiffer Vacuum, one of the world's leading producers of vacuum products and services, has introduced the Sputter Process Monitor SPM 220 and High Pressure Analyzer HPA 220 gas analysis systems. Both system solutions are based on the proven mass spectrometer PrismaPlus in combination with a dry compressing HiPace turbo pumping station and are used to monitor and document vacuum processes, such as coating architectural glass or thin-film solar cells. The SPM 220 and the HPA 220 are available in mass ranges of 1-100 and 1-200 amu; the HPA 200 is also available from 1-300 amu.

The Sputter Process Monitor SPM 220 is characterized by a specially developed ion source, which enables a direct connection between the analyzer and the process chamber. This enables the vacuum conditions of sputter processes and similar applications to be monitored without the time delays of an inlet system, at a pressure up to 10-2 mbar. An additional orifice system allows the pressure range to be expanded up to 10 mbar.

The High Pressure Analyzer HPA 220 is available, depending on the application conditions, with three different gas inlet valves, both manually and electropneumatically operated. Its compact, modular design provides a versatile solution for gas analysis in the pressure range from high vacuum to 50 mbar.

The SPM 220 and HPA 220 are equipped with a number of digital and analog inlets and outlets which enable their simple connection to process control systems. The newly developed operating software is distinguished with a clearly laid out user interface as well as simple documentation of measurement results. Furthermore, it is possible to modify the software for special process requirements.

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Pfeiffer Vacuum Ltd