It also offers the ability to measure the Raman spectra of microscopic samples, along with Ultraviolet and Near Infrared microscopy of semiconductor and other types of samples. Due to its flexible design, which gives it the ability to analyze the largest samples, applications are numerous and include mapping thin film thickness of large devices, locating and identifying contaminants, measuring strain in silicon and much more. With the ability to spectrally analyze and image microscopic samples or microscopic areas on large devices, the 20/20 XL™ microspectrophotometer is the cutting-edge micro-analysis tool for anufacturing facilities.
The 20/20 XL™ microspectrophotometer offers an advanced film thickness measurement unit, a Raman spectrometer, a sophisticated UV-visible-NIR range microscope, high-resolution digital imaging and powerful, easy-to-use software. This flexible instrument is designed to attach to large frames that can accomodate large scale samples. It is able to acquire data from microscopic features of very large samples by absorbance, reflectance or even luminescence spectroscopy. By including high-resolution digital imaging, the user is also able to use the instrument as a ultraviolet or infrared microscope.
Additionally, CRAIC Apollo™ Raman spectroscopy modules may be added so the user may also acquire small spot Raman spectra. Touch screen controls, sophisticated software, calibrated variable apertures and other innovations all point to a new level of sophistication for microanalysis. With high sensitivity, durable design, ease-of-use, multiple imaging and spectroscopic techniques, automation and the support of CRAIC Technologies, the 20/20 XL™ is more than just a quality control measurement tool…it is the solution to your analytical challenges.
For more information on the 20/20 XL Film ™ Thickness Measurement Tool and the Perfect Vision for Science™, visit the company article page.