Raman, PL and AFM Measurements on Laser Lithographically Written Structures in Si>

Application Articles

Raman, PL and AFM Measurements on Laser Lithographically Written Structures in Si
15 Nov 2012

Silicon (Si), being the second most common element in the earth’s crust, is the material most widely used for integrated circuits as well as solar cells. Raman measurements can effectively probe the strain state of crystalline materials and thus provide an effective, non-destructive way of developing the most appropriate production process. In this application note from WITec the structures in crystalline Si written by laser lithography were examined on the same instrument using Confocal Raman Imaging, Confocal PL Imaging and AFM.