MFM 310

MFM 310
by Rigaku Corporation


The Rigaku MFM310 performs high-precision measurements not possible by optical or ultrasonic techniques. Perform thickness, density, roughness & composition of films on blanket and patterned wafers. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks....read more

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Description

 

The Rigaku MFM310 performs high-precision measurements not possible by optical or ultrasonic techniques. Perform thickness, density, roughness & composition of films on blanket and patterned wafers.

This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks.

The MFM310 is designed with high-volume 200mm and 300mm manufacturing in mind: high-throughput thickness measurement by XRR and XRF, low-contamination wafer handling and pattern recognition-based position control for product wafer measurements, CE Marking and S2/S8 Compliance for semiconductor production clean room operation, compliance with GEM-300/HSMS and factory automation standards, high-reliability machine performance and low power consumption and cost of ownership.

MFM 310 Features:

  • Micro-spot X-ray beams and pattern recognition
  • High-throughput, product-wafer measurements
  • Wide range of materials and applications
  • High resolution and precision covering thicknesses from Ångstroms to microns
  • For 200mm and 300mm wafers
  • Available with 300mm factory automation
  • Design based on SEMI S2 and SEMI S8

Product Overview

MFM 310 by Rigaku Corporation
MFM 310

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