Determination of Impurities in Electronic- Grade Hydrochloric Acid with the NexION 300S ICP-MS
1 August 2012

This application note demonstrates the ability of the NexION 300 ICP-MS to remove interferences so that trace levels of metal impurities in electronic grade hydrochloric acid can be measured under a single set of hot plasma conditions for all analytes in one analysis of the semi conductor wafer.

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