By incorporating plasma ion source technology, the Vion PFIB delivers increased throughput over conventional gallium FIB instruments-with speeds more than 20x faster for site-specific cross-sectioning and large area milling, as well as sample preparation.
With both excellent milling precision and high-resolution imaging at low beam currents, the Vion PFIB delivers the speed, accuracy and high contrast images essential for a wide range of process control, failure analysis or materials research applications.