ULTRA Series - Ultra High Resolution FE-SEM for Nano-scale Compositional Analysis

Manufacturer ZEISS Microscopy


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The ULTRA FE-SEM is the ultimate lab tool to meet the most demanding requirements from material science, life science and semiconductor applications. The ULTRA FESEM integrates the latest developments in GEMINI® technology utilising a newly developed Energy selective Backscattered detector (EsB®).

The ULTRA features the GEMINI® In-lens SE detector for clear topographic imaging and the EsB® detector for compositional contrast imaging enabling simultaneous real time imaging and mixing of both signals. The EsB® detector incorporates filtering technology which enables high resolution energy selective BSE imaging at low voltages revealing previously unseen image details.

Combined with the optional AsB® (Angle selective Backscattered electron) detector for compositional and crystal orientation imaging, the ULTRA FE-SEM delivers high resolution nanostructural information along with surface topography, composition, crystal orientation and magnetic domains.

The key advantages of the ULTRA FESEM are as follows:
• Designed-in ease of use for high reliability in Multi-User laboratories
• EsB® detector for compositional information fully integrated
• Low kV BSE imaging at short working distance: WD = 1mm
• Ultra stable high beam current for analytical applications up to 100 nA @ 0.2%/h
• GEMINI® technology with high efficiency In-lens detector for high contrast topographic imaging
• No magnetic field at the specimen level
• Superb resolution and image quality at high and low operating voltages
• Extremely wide operating voltage range from 0.02-30kV
• Beam current up to 100 nA
• Sub nm resolution at 15 kV
• Local Charge Compensator in ULTRA PLUS for imaging of non conductive sample

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ULTRA Series - Ultra High Resolution FE-SEM for Nano-scale Compositional Analysis

Manufacturer ZEISS Microscopy

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