SU9000 UHR FE-SEM by Hitachi High Technologies America, Inc.
Manufacturer Hitachi High Technologies America, Inc.
The SU9000 Ultra High Resolution FE-SEM is Hitachi's new premium UHR FE-SEM. It features unique electron optics, with the sample positioned inside a gap of the split objective lens pole piece. This so-called true inlens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible imaging resolution (0.4nm @ 30kV, 1.2nm @ 1kV) and stability. To make this resolving power usable in practical work in your lab, the SU9000 utilizes an ultra-... Read more
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SU9000 UHR FE-SEM
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The SU9000 Ultra High Resolution FE-SEM is Hitachi's new premium UHR FE-SEM. It features unique electron optics, with the sample positioned inside a gap of the split objective lens pole piece.
This so-called true inlens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible imaging resolution (0.4nm @ 30kV, 1.2nm @ 1kV) and stability.
To make this resolving power usable in practical work in your lab, the SU9000 utilizes an ultra-stable side-entry sample stage similar to high-end TEM systems and incorporates optimized vibration damping and a closed cabinet to shield the electron optics from environmental noise. Furthermore, the clean vacuum concept of SU9000 offers a one order of magnitude better vacuum level in gun and sample chamber than the previous generation, minimizing sample contamination artefacts (effective pre-observation cleaning of samples itself can be achieved by Hitachi's ZoneSEM sample cleaner).
This so-called true inlens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible imaging resolution (0.4nm @ 30kV, 1.2nm @ 1kV) and stability.
To make this resolving power usable in practical work in your lab, the SU9000 utilizes an ultra-stable side-entry sample stage similar to high-end TEM systems and incorporates optimized vibration damping and a closed cabinet to shield the electron optics from environmental noise. Furthermore, the clean vacuum concept of SU9000 offers a one order of magnitude better vacuum level in gun and sample chamber than the previous generation, minimizing sample contamination artefacts (effective pre-observation cleaning of samples itself can be achieved by Hitachi's ZoneSEM sample cleaner).
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SU9000 UHR FE-SEM
Manufacturer Hitachi High Technologies America, Inc.
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