Helios NanoLab 460HP - DualBeam by FEI Company
The Helios NanoLab series is the world’s most advanced DualBeam platform for imaging, analysis, and TEM sample preparation in semiconductor failure analysis, process development and process control laboratories.
All Helios NanoLab 60 series systems combine the innovative Elstar™ with UC technology electron column for high-resolution, high-contrast imaging with the high-performance Tomahawk™ ion column for fast, precise sample preparation.
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