The CLM-3D delivers three-dimensional metrology information to meet the rapid prototyping and process control needs of modern semiconductor manufacturers.
Combining an electron column, for scanning electron microscope (SEM) imaging, and high current ion column, for focused ion beam (FIB) milling, on a high throughput DualBeam platform uniquely qualifies the CLM-3D to provide high precision cross sectional metrology.
The supplier does not provide quotations for this product through SelectScience. Browse these related products instead
Related Products
.jpg.ashx?width=100&height=100&bgcolor=white)
CLM-3D - DualBeam
The CLM-3D delivers three-dimensional metrology information to meet the rapid prototyping and process control needs of modern semiconductor manufacturers.
Combining an electron column, for scanning electron microscope (SEM) imaging, and high current ion column, for focused ion beam (FIB) milling, on a high throughput DualBeam platform uniquely qualifies the CLM-3D to provide high precision cross sectional metrology.
Product Overview
