CLM-3D - DualBeam by FEI Company
The CLM-3D delivers three-dimensional metrology information to meet the rapid prototyping and process control needs of modern semiconductor manufacturers.
Combining an electron column, for scanning electron microscope (SEM) imaging, and high current ion column, for focused ion beam (FIB) milling, on a high throughput DualBeam platform uniquely qualifies the CLM-3D to provide high precision cross sectional metrology.
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