Agilent 7700s ICP-MS by Agilent Technologies
Manufacturer Agilent Technologies
High performance for high purity semiconductor applications The Agilent 7700s ICP-MS is configured for the ultra-trace elemental analysis of high purity materials such as those monitored in the semiconductor industry. With a high efficiency sample introduction system, optional 5th plasma gas line, and second (reaction) cell gas line as standard, the 7700s offers high performance for the removal of intense interferences in known and consistent matrices. With unmatched cool plasma capability... Read more
Agilent 7700s ICP-MS
High performance for high purity semiconductor applications
The Agilent 7700s ICP-MS is configured for the ultra-trace elemental analysis of high purity materials such as those monitored in the semiconductor industry. With a high efficiency sample introduction system, optional 5th plasma gas line, and second (reaction) cell gas line as standard, the 7700s offers high performance for the removal of intense interferences in known and consistent matrices. With unmatched cool plasma capability, the 7700s also delivers industry-leading performance for the measurement of easily ionized elements in high-purity materials, allowing all common semiconductor analytical methods to be performed on the same instrument.
The Agilent 7700s ICP-MS is configured for the ultra-trace elemental analysis of high purity materials such as those monitored in the semiconductor industry. With a high efficiency sample introduction system, optional 5th plasma gas line, and second (reaction) cell gas line as standard, the 7700s offers high performance for the removal of intense interferences in known and consistent matrices. With unmatched cool plasma capability, the 7700s also delivers industry-leading performance for the measurement of easily ionized elements in high-purity materials, allowing all common semiconductor analytical methods to be performed on the same instrument.
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