Focused Ion Beam Microscopes (FIB)

This system delivers unmatched capabilities for extreme large-volume 3D analysis, Ga-free sample preparation, and precise micromachining. Featuring an innovative, fully integrated femtosecond laser, it offers the fastest material removal ... Read more...

Focused Ion Beam Milling & Imaging System Read more...

Direct Write E-beam Lithography System Read more...

Direct Write E-beam Lithography System Read more...

E-Beam Mask/Reticle Writer Read more...

Multibeam System Read more...

The Hitachi NB5000 FIB-SEM integrates a superior 40kV Ga ion FIB column with an ultra-high-resolution Schottky FE-SEM. Like all our products, all components have been designed with consideration of the total system performance. This ... Read more...

Within ZEISS Crossbeam Family you have the choice between Crossbeam 340 or Crossbeam 550. Exploit the variable pressure capabilities of Crossbeam 340. Or use Crossbeam 550 for your most demanding characterizations and choose the chamber si... Read more...