Thin Films on Silicon

5 March 2012

This application note demonstrates the capabilities of EDXRF for the measurement of thin film thickness (Tox) applied to semiconductor wafers. Simple 2-point empirical calibrations are used for SiO2, AlSi, Ti, TiN, Pt, AlCu, and BPSG single layer films on silicon substrates for use in quality control in the semiconductor industry.

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