2 October 2012
In this video Dr. Mohan Ananth from Carl Zeiss Microscopy tells SelectScience about the new ORION NanoFab which was introduced at EMC 2012. The ORION NanoFab is the first multi-ion-beam tool based on Gas Field Ion Source (GFIS) technology and it enables users to fabricate sub-10 nm nanostructures with speed and precision. The ORION NanoFab is the only system in the world in which gallium, neon and helium ion beams are integrated in a single instrument. Dr. Ananth discusses some of the applications enabled by the ORION NanoFab including circuit editing in semi conductor development, the fabrication of plasmonic devices and nanopore creation in biosensors, as well as the potential applications of the instrument in faster genome sequencing for routine diagnostics. Interview filmed by SelectScience at EMC 2012.